Nanotechnology News – Latest Headlines

Shedding light on nature's nanoscale control of solar energy

Across billions of years of evolution, Nature has retained a common light-absorbing hexameric cofactor core for carrying out the very first chemical reaction of photosynthesis, the light-induced electron transfer across approximately 3 nm. This process has direct analogies to light-driven charge separation in photovoltaic devices.

Apr 19th, 2012

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Imaging complex domain wall structures in magnetic nanostripes

Researchers from the NIST Center for Nanoscale Science and Technology and Massachusetts Institute of Technology have used the scanning electron microscopy with polarization analysis (SEMPA) technique to provide the first direct images of the magnetic structure of highly twisted domain walls in patterned thin film magnetic nanowires.

Apr 19th, 2012

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Nanodot-based memory sets new world speed record

A team of researchers from Taiwan and the University of California, Berkeley, has harnessed nanodots to create a new electronic memory technology that can write and erase data 10-100 times faster than today's mainstream charge-storage memory products.

Apr 18th, 2012

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'Organic', the new electronics revolution

'Organic and large-area electronics' (OLAE) is focused on materials and devices built from organic carbon-based molecules that are able to conduct electricity. Because these are lighter, more flexible and less expensive than inorganic conductors, such as copper or silicon, they are a viable alternative for many electronics applications.

Apr 18th, 2012

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American Associates, Ben-Gurion University of the Negev receives $3 million pledge for new nanotechnology facility

American Associates, Ben-Gurion University of the Negev (AABGU) just received a $3 million pledge from long-time AABGU supporter and National Vice President Ruth Flinkman-Marandy and Ben Marandy. This generous donation will support a new atom chip and quantum optics research and development facility at Ben-Gurion University of the Negev in Beer-Sheva, Israel.

Apr 18th, 2012

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Using eBeam technologies to improve 20nm and 14nm wafer yields

The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest breakthroughs using eBeam technologies to improve photomask critical dimension uniformity (CDU) and wafer yields this week during Photomask Japan (PMJ) 2012, the 19th international symposium on photomasks and nextgeneration lithography masks being held at the Pacifico Yokohama in Yokohama, Japan.

Apr 18th, 2012

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