Cadence Design Systems, Inc. announced the immediate availability of two intellectual property solutions for third-party designs on the 28nm FD-SOI process node that is accessible via the recently announced agreement between STMicroelectronics and Samsung Electronics.
The Hiden IMP-EPD end point detector system directly monitors the surface ions generated in the etching process, identifying the species present, their relative abundances and precisely defining the interlayer boundary to just 2.5 Angstrom. Species with molecular weights up to 300amu are determined.
The NPXY60-258 and the NPXY60Z20-257 piezo stages are the latest additions to nPoint's nanopositioning lineup. These stages are designed for advanced research markets in need of UHV and non-magnetic positioning.
Agilent Technologies Inc. introduced its AFM-enabled Scanning Electrochemical Microscopy (SECM) mode, a seamlessly integrated technology package that enables scientists to perform scanning electrochemical microscopy on conductive and insulating samples. The system uses an Agilent atomic force microscope.
Toshiba Corporation today announced that it will demolish the No. 2 semiconductor fabrication facility (Fab 2) at Yokkaichi Operations, the company's NAND Flash memory plant in Mie prefecture, Japan, and replace it with a new fab on the same site.
NanoH2O, manufacturer of efficient and cost-effective reverse osmosis (RO) membranes for seawater desalination, announced it has been acquired by LG Chem. LG Chem is based in Seoul, Korea, and ranks as one of the leading chemical companies in the world.
The alliance will allow clients of XRCC and Battelle to access the deep capabilities of the two renowned research organizations - including the use of XRCC's pilot plant and manufacturing scale-up facility - to augment their own resources in developing and bringing new products to market.